- Status Operational
- Availability Commercial
Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is a chemical characterization technique that can be utilized on any kind of material that can withstand vacuum. The technique is operated in various modes, which enables surface mass spectra as well as surface ion images to be obtained (i.e. chemical information). By employing a sputter gun in conjunction with the analysis gun, a depth profile can be obtained. During the depth profiling process ion images are obtained as a function of depth, i.e. 3D chemical imaging. The technique offers a depth resolution of a few nanometers, an image resolution of ~200 nm (50 nm on newer instruments), and a detection limit in the ppm–ppb range.
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