Key Details
- Status Operational
- Availability Commercial
- FacilitySee facilities below
Listing Description
– Microwave plasma device: a versatile plasma source that can be used for plasma assisted sputtering, plasma immersion ion implantation, etching and ion beam extraction. For detailed plasma diagnostics mass spectrometry, optical emission spectroscopy and different probes are available.
– Inductively coupled plasma etcher for plasma etching of different materials using Ar, CF4, SF6 and other reactive gases. Ashing or dry surface cleaning are also available.
– Low temperature oxidation reactor: A 6 m long reactor for investigation of gas purification (removal of NOx, SOx, VOC, etc.) using ozone injection, direct plasma treatment and catalytic materials. Up to 250 standard liter per minute flue gas with process control including measurement of ozone, NO, NO2, and other gas species by Fourier transform infrared spectroscopy (FTIR).
Read more https://www.energy.dtu.dk/